The image depicts a novel precision patterning method using the United States Department of the Air Force emblem on monolayer MoSe2, a two-dimensional material made of atomic layers. Air Force Research Laboratory, or AFRL, researchers from the Materials and Manufacturing Directorate contributed this work to the February 2023 ACS Nano publication “Precision Modification of Monolayer Transition Metal Dichalcogenides via Environmental E‑Beam Patterning.” The publication introduced an innovative process of altering and tailoring the optoelectronic properties of transition metal dichalcogenides, or TMDs. Researchers can control and manipulate the atomic properties of these materials to draw lines, shapes and desired patterns to demonstrate how the material’s thermal and optical properties can be manipulated for sensing and other technologies. (U.S. Air Force graphic)
CAMERA
N/A
LENS
APERTURE
SHUTTERSPEED
ISO
No camera details available.
This photograph is considered public domain and has been cleared for release. If you would like to republish please give the photographer appropriate credit. Further, any commercial or non-commercial use of this photograph or any other DoD image must be made in compliance with guidance found at https://www.dimoc.mil/resources/limitations, which pertains to intellectual property restrictions (e.g., copyright and trademark, including the use of official emblems, insignia, names and slogans), warnings regarding use of images of identifiable personnel, appearance of endorsement, and related matters.